The RFICP100 is a compact gridded ion source product which is well suited for ion beam sputter deposition and ion beam etching. Its ion beam output (> 400mA) is impressive when compared to its compact physical size. The source diameter is 19cm and mounts on a 10” CF flange. It can fit small to medium chamber platforms. In ion beam sputtering, the ion source is outfitted with ion optics which confine the beam to the sputtering target. While in ion beam etching, the ion source is outfitted with ion optics which optimize uniformity. Under the standard configuration, the typical ion energy range is from 100 to 1200eV, while the ion current can exceed 400mA.