KRI's products are used in a vacuum environment to deposit thin films, dry etch nanostructures, and modify surface properties.
The following table lists common material processes in which KRI products are employed.
|In-situ substrate preclean
|Ion-beam modification of material and surface properties
|- Surface polishing or smoothing
|- Surface nanostructures and texturing
|- Ion figuring and enhancement
|- Ion trimming and tuning
|- Surface-activated bonding
|- Reactive ion-beam etching
|- Chemically assisted ion-beam etching
|Ion-beam sputter deposition
|- Reactive ion-beam sputter deposition
|- Biased target ion-beam sputter deposition
|- Hard and functional coatings