KRI's products are used in a vacuum environment to deposit thin films, dry etch nanostructures and modify surface properties.

The following table lists common material processes where KRI products are employed.

Common Process Applications
Process Identification Common Acronyms
In-Situ Substrate Preclean PC
Ion Beam Modification of Material & Surface Properties IBSM
- Surface polishing or smoothing
- Surface nano structures and texturing
- Ion figuring and enhancement
- Ion trimming and tuning
- Surface activated bonding SAB
Ion Beam Assisted Deposition IBAD
Ion Beam Etching IBE
- Reactive Ion Beam Etching RIBE
- Chemically Assisted Ion Beam Etching CAIBE
Ion Beam Sputter Deposition IBSD
- Reactive Ion Beam Sputter Deposition RIBSD
- Biased Target Ion Beam Sputter Deposition BTIBSD
Direct Deposition DD
- Hard and functional coatings