Relatively new as a material process technology, ion source applications have steadily grown in popularity. As the virtues of ion-beam process capabilities are discovered, process engineers and researchers are achieving desirable film and surface properties which were previously not attainable without the use of our technology. Today, our products are applied in many commonly accepted processes, including:
Thin films with thicknesses of several monolayers.
Reproducible adhesion of metal coatings for high yield lift-off processes.
Etched wafers with tight uniformities and critical geometrical dimensions.
Surface modification and texturing to amplify surface work functions.
Dense and stable films with optimized refractive indices and low absorption.
Anisotropic and uniform etching of nanometer features in metal and dielectric multilayer stacks.
High-throughput manufacturing of durable AR coatings that adhere to plastic lenses.
Hard and corrosion-resistant organic coatings which exhibit designable biological activity.
Smooth, low-scatter, and optically pure films with high laser-induced damage thresholds.