Examples of how KRI® solutions have revolutionized specific processes include:
Relatively new as a material process technology, ion source applications have steadily grown. As awareness of the virtues of ion beam processes has increased, process engineers and researchers have achieved desirable film and surface properties that were unattainable without the use of our technology. Today, our products are applied in many processes that have become industry standards.
Thin films with thicknesses of several monolayers.
Reproducible adhesion of metal coatings for high yield lift-off processes.
Etched wafers with tight uniformities and critical geometrical dimensions.
Surface modification and texturing to amplify surface work functions.
Dense and stable films with optimized refractive indices and low absorption.
Anisotropic and uniform etching of nanometer features in metal and dielectric multilayer stacks.
High-throughput manufacturing of durable AR coatings that adhere to plastic lenses.
Hard and corrosion-resistant organic coatings which exhibit designable biological activity.
Smooth, low scatter, and optically pure films with high laser induced damage thresholds.