Photo Coming Soon

The RFICP40 is the smallest and most cost-effective RF gridded ion source product. It is well suited for installations in smaller vacuum platforms. At an attractive cost, the RFICP40 product brings the latest gridded technology innovations to research and develop applications. The research scientist can have access to filament-less technology which makes the RFICP40 a productive tool when the use of reactive gases are a dominant variable in the process strategy. Under the standard configuration, the typical ion energy range is from 100 to 1200eV, while the ion current can exceed 120mA.

DischargeRF Inductive Coupled
- Filament CathodesN/A
- RF Power0.6kW
Ion OpticsOptiBeam™
- GridsApplication Specific
- Beam Size @ Grid4cm (Typical)
NeutralizerLFN 2000 (Standard)
Power controllerRFICP 1510-2-06-LFNA
- Cathode / NeutralizerLFN1000 or MHC1000 or RFN
- MountRemote or Direct Flange
- Height (Nominal)5.0″
- Diameter (Nominal)5.3″
- Materials ProcessedMetals, Dielectrics, Semiconductors
- Process GasesInert, Reactive, Blends
- Typical Installation Distance6-18″
- Process (Common)Pre-Cleaning, Surface Modification, Ion Beam Assisted Deposition, Ion Beam Etch, Ion Beam Sputter Deposition
- Auto ControllerControls up to 4 Gases with Blending Capabilities and Recipe Storage
- Ion OpticsCollimated, Focused, Defocused

Self-Aligning Grids (OptiBeam™)

The KDC product line incorporates KRI’s patented self-aligned ion optics technology. The OptiBeam™ grids do not require an alignment procedure. Through advanced engineering and precision construction, the straightforward assembly procedure assures the grids are aligned. The benefits of the self-aligning grids includes beam repeatability, extended grid lifetime, maximized ion current, reduced maintenance time and improved uptime.