The KRI® products incorporate a range of plasma technology. These technologies offer unique operation and performance specifications. The range of technologies allows the application of the correct ion source and power supply product to meet the process objectives. The technologies are classified by category:

Gridless End-Hall eH Sources

The eH products output a high current and a low energy beam. The ion current meets specifications for high process rates, while the low energy ion bombardment eliminates damage to surfaces and interfaces. View Product Line

Gridded RFICP Sources

The RFICP products produce a high density discharge without the use of filaments. The beam extracted from the discharge is precisely controlled to provide a defined shape, current density and ion energy. View Product Line

Gridded KDC Sources

The KDC products are enhanced designs of the typical Kaufman source. Traditional ion beam processing is available with the high quality and the stable beams output by these sources. View Product Line

Power Supplies

Our power supplies operate various ion, plasma and electron sources. These products are specialized to output stable and repeatable power to the dynamic loads used in plasma processing. View Product Line