eH3000

The high power eH3000 is best suited for large area applications. Compared to other high power plasma sources, the eH3000 is the most efficient and high ion flux plasma source available on the market.

• Dimensions: diameter = 9.7" height = 6"
• Discharge Voltage/Current: 50-300V/20A
• Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors

Features & Benefits

• Removable Anode Assembly
  • Ease of maintenance
  • Minimizes down-time during maintenance
  • Plug-and-play spare anode
• Broad-Beam High Discharge Current
  • Divergent beam covers a large area
  • High etch rate
  • High ion-assist deposition (IAD) rates
• Water-cooled anode and front plate options
  • Heat reduction at substrate
  • Expedited cool down for quicker maintenance cycle
• Versatile
  • Ultra High Vacuum (UHV) compatible
  • Easy installation
• Cost Efficient
  • Lower cost per mA/cm² than gridded sources
  • Low maintenance cost
• Efficient plasma conversion and stable power control

Applications

• IAD
• In-situ preclean
• Direct Deposition
• Surface Modification
• Low-energy etching
• III-V Semiconductors
• Polymer Substrates