The eH Linear ion source is a new, innovative and successful approach to meet the requirements for a linear ion beam application. The b Linear product uses the eH400 end-Hall source as the building block. By aligning the eH400 sources, a linear array can easily be defined to match the application size. A low cost linear-arrayed ion source can be constructed to accommodate a variety of substrate widths. The array configuration can permit linear ion source lengths up to approximately 1 meter. The flexibility to space the modules in the proper location is significantly beneficial towards achieving the optimal ion current doses, uniformity and process rates. Since the modules are operated in parallel, this technology simplifies the gas, power and electron distribution. Because the eH Linear product uses standard end-Hall modules, the technology minimizes equipment requirements, resulting in a cost effective, high current, low energy ion beam source available for web coating, in-line deposition, and cylindrical rotary sputtering systems.
- eHL 400-X
- eH200 Modules
|Discharge||DC Magnetic Confinement|
|- Discharge Voltage||40-200V VDC|
|- Anode Construction||Modular Assembly|
|- Cathode / Neutralizer||Filamentless|
|- Beam Divergence||> 45° (hwhm)|
|- Anode||Standard or Grooved|
|- Mount||Remote or Direct Flange|
|- Height (Nominal)||10cm|
|- Width (Nominal)||10cm|
|- Length (Nominal)||~ 100cm|
|- Process Gases||Ar, Xe, Kr, O2, N2, Others|
From the plasma discharge, ions accelerate into a beam with a divergent ion current flux. The half maximum-half angle exceeds a 45º angle from the source axis. The divergent beam from an eH product covers a large area. The capability to uniformly cover a wide process zone facilitates high throughput operation, since a process run with a large load of parts or large substrate area becomes practical with an eH product.
The eH product technology relies on a gridless construction. The ions accelerate directly from the plasma discharge to form the beam. The gridless eH technology complements our gridded ion source products, because it produces desirable beam properties not easily available with gridded sources. Other benefits of the eH gridless feature, include no need to maintain, align or replace grids. The eH products are rugged and simple to operate. And they typically cost less than their gridded counterparts.
High Density DC Discharge
The KDC products utilize a well-proven and efficient plasma generation process. In the discharge chamber, a cathode thermionically emits a reliable source of electrons. The electrons are attracted to a DC biased metal anode. The neutral gas species is efficiently ionized due to a confining magnetic field. This mechanism produces a high density plasma of many gases, including Ar, Xe, O2, N2 and other reactive gases.
Low Energy & High Current Output
The eH products output a high current and low energy beam. The high ion current meets critical arrival ratios for high process rates. Also, the high current enables productive processing on tough, hard materials. While the low energy ion bombardment eliminates damage to surfaces and interfaces. The capability to process at low energies has proven merit when working with delicate materials.
The standard KDC neutralizer configuration is an inexpensive refractory metal filament stretched across the ion beam. The filament is heated to thermionic emission temperature. The filament neutralizer may be replaced with an alternative non-immersed neutralizer. The non-immersed neutralizer sits to the side of the source and outside the ion beam. When the neutralizer is outside the beam, the time between maintenance is significantly longer for the non-immersed neutralizer versus the filament neutralizer. This non-immersed configuration is suited for low frequency maintenance installations and long operational runs when it is important to minimize the risk of process interruption.
Quick Change Anode Module
The eH Product incorporates our patented quick- change anode module assembly. The anode module can be quickly removed from the ion source for maintenance, while the source body remains in the chamber. The anode module is light weight and interchangeable. By simply exchanging the working anode module with a spare module, the eH product can be ready to run within minutes. The removed anode module can be easily maintained on a work bench while your vacuum chamber continues to be productive. The uptime benefits are significant.
The KDC product line provides a dedicated and regulated electron source neutralizer. With a reliable source of electrons, the KDC products can process dielectric, electrically isolated, and electrostatic sensitive substrates. The amount of electrons is precisely controlled to match positive charges. The correct amount electrons are present in the ion beam and they arrive at the substrate surface to provide an electrically neutral process. The KDC operation does not need to rely on an ambiguous source of electrons such as exposed and conductive chamber hardware. Coating build-up and stray electromagnetic fields, which may be present in the vacuum chamber, will not disturb the ion beam quality, stability or neutralization of the KDC products. However, in the case, when the neutralization process is not so critical, the KDC products do allow operation without the neutralizer.