eH1000web@golinden.com2025-04-16T15:24:37-06:00 eH1000The efficient gas-utilizing eH1000 is ideally suited to provide cost-effective, high-current ion beams for medium-sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching. Dimensions: Diameter = 5.7” height = 5.5” Discharge Voltage/Current: 50-300V/10A Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors Request a quote Features & Benefits Removable Anode Assembly Ease of maintenance Maximize system uptime Plug-and-play spare anode Broad-Beam High Discharge Current Uniform etch rates High etch rate High ion assist deposition (IAD) rates High current densities Versatile Load lock/Ultra High Vacuum (UHV) compatible Easy installation Radiant cooled (no water cooling required) Cost Efficient Lower cost per mA/cm2 than gridded sources Low maintenance cost Stable Plasma and power control with high efficiency. Applications IAD Load Lock Preclean In-situ Preclean Direct Deposition Surface Modification Low-energy etching Polymer Substrates Start the ProcessFind a RepresentativeOur Gridless End-Hall eH SourceseH400The compact and efficient eH400 is ideally suited to provide cost-effective, high-current ion beams for small- to medium-sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.eH1000The eH1000 is ideally suited to provide cost-effective, high-current ion beams for medium sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.eH2000The powerful eH2000 is ideally suited to provide cost-effective, high-current ion beams for medium to large sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.eH3000The high power eH3000 is best suited for large area applications. Compared to other high power plasma sources, the eH3000 is the most efficient and high ion flux plasma source available on the market.eH LinearThe scalable eH Linear product line is designed for inline and roll-to-roll coating applications. KRI’s modular approach allows for optimizing uniformity across large areas. The robust end-hall product line increases the mean time between maintenance. Contact UsIf you have questions about any of our products or their applications, please contact us. We look forward to hearing from you. Send us A QUESTION Find a Representative
