eH2000

The powerful eH2000 is ideally suited to provide cost-effective, high-current ion beams for medium to large sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.

  • Dimensions: diameter = 5.7″ height = 5.5″

  • Discharge Voltage/Current: 50*-300V/10A or 15A *Process dependent

  • Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors

Features & Benefits

  • Removable Anode Assembly

    • Ease of maintenance

    • Minimizes down-time during maintenance
    • Plug-and-play spare anode

  • Broad-Beam High Discharge Current

    • Uniform etch rates

    • High etch rate
    • High ion assist deposition (IAD)rates

  • Water cooled

    • Performance benefits of the eH1000 at higher output current

  • Versatile

    • Load lock/Ultra High Vacuum (UHV) compatible

    • Easy installation

  • Cost Efficient

    • Lower cost per mA/cm2 than gridded sources
    • Low maintenance cost

  • Efficient plasma conversion and stable power control

Applications

  • IAD

  • Load Lock Preclean

  • In-situ Preclean

  • Direct Deposition

  • Surface Modification

  • Low-energy etching

  • Polymer Substrates

Start the Process

Our Gridless End-Hall eH Sources

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If you have questions about any of our products or their applications, please contact us. We look forward to hearing from you.

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