eH400

The compact and efficient eH400 is ideally suited to provide cost-effective, high-current ion beams for small to medium sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.

  • Dimensions: diameter = 3.7″ height = 3″

  • Discharge Voltage/Current: 50-300 V/5 A

  • Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors

Features & Benefits

  • Removable Anode Assembly

    • Ease of maintenance
    • Minimizes down-time during maintenance
    • Plug-and-play spare anode

  • Broad-Beam High Discharge Current

    • Uniform etch rates
    • High etch rate
    • High ion assist deposition (IAD) rates

  • Versatile

    • Load lock/Ultra High Vacuum (UHV) compatible
    • Small footprint

  • Cost Efficient

    • Lower cost per mA/cm2 than gridded sources
    • Low maintenance cost

  • Efficient plasma conversion and stable power control

Applications

  • IAD

  • Load Lock Preclean

  • In-situ Preclean

  • Low-energy etching

  • Polymer Substrates

Start the Process

Our Gridless End-Hall eH Sources

A close up of a KDC source being put together. A the pieces or organized and piled together.

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If you have questions about any of our products or their applications, please contact us. We look forward to hearing from you.

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