The RFICP140 is a robust RF gridded ion source is available direct mounted on a CF flange or remote mounted. The RFICP140 is well suited for ion beam sputter deposition, ion assisted deposition, and ion beam etching. In ion beam sputtering, the ion source is outfitted with ion optics which confine the beam to the sputtering target. In ion assisted deposition, the RFICP140 would typically be outfitted with ion optics that maximize the ion beam spread. While in ion beam etching, the ion source is outfitted with ion optics which optimize uniformity. Under the standard configuration, the typical ion energy range is from 100 to 1500eV, while the ion current can exceed 600mA.