The KDC40 is a small and cost-effective DC gridded ion source product. A new design and upgrade to the popular 3cm Kaufman source, it has a larger grid pattern, is more rugged, and is outfitted with Self-aligned ion optics. The KDC40 can perform all the typical ion-beam processes, including in-situ preclean, ion-beam surface modification, ion-beam-assisted deposition, ion-beam sputter deposition, ion-beam etching, and direct deposition. The versatility of the KDC40 justifies its place in the process tool set of any laboratory where device fabrication involves thin-film deposition and plasma etching. Under the standard configuration, the typical ion energy range is from 100 to 1200eV, while the ion current can exceed 120mA.