The KDC10 is the smallest and most cost effective KDC gridded ion source product. It is well suited for installations in smaller vacuum systems, including desktop platforms. The KDC10 can be configured for in-situ preclean, ion beam sputter deposition, and ion beam etching. The ability to perform Argon ion beam etching at low energies (<1000eV) has enabled significant improvements in the area of microscopy sample preparation, including low damage, wide-area ion polishing and etching. At an attractive cost, the KDC10 product lowers financial barriers and allows the research scientist to consider the benefits of adding broad beam processing to their laboratory tools. Under the standard configuration, the typical ion energy range is from 100 to 1200eV, while the ion current can exceed 10mA.