The RFICP220 is a powerful gridded ion source which is well suited for ion beam sputter deposition, ion assisted deposition, and ion beam etching. In ion beam sputtering, the ion source can be outfitted with focused ion optics which confine the beam to the sputtering target. In ion assisted deposition, RFICP220 would typically be outfitted with ion optics which maximize the ion beam spread. While in ion beam etching, the ion source is outfitted with ion optics which optimize uniformity. The RFICP220 has the largest selection of ion optic assemblies, covering process areas larger than 2 meters. Under the standard configuration, the typical ion energy range is from 100 to 1500eV, with ion current output to 2000mA.