MHC1000
ProductMHC1000
Configurations
- Process GasesInert, Reactive, Blends
- Typical Installation Distanceend-Hall, Anode Layer, Gridded
- Process (Common)Pre-Cleaning, Surface Modification, Ion Beam Assisted Deposition, Direct Deposition, Ion Beam Etch, Ion Beam Sputter Deposition
- Source GasInert (Ar, Xe)
- Emission StructureInert (Ar, Xe)
- RegulationEmission Current
- CouplingNon-Immersed