LHC1000
| Product | LHC1000 |
|---|---|
| Configurations | |
| - Process Gases | Inert, Reactive, Blends |
| - Typical Installation Distance | end-Hall, Anode Layer, Gridded |
| - Process (Common) | Pre-Cleaning, Surface Modification, Ion Beam Assisted Deposition, Direct Deposition, Ion Beam Etch, Ion Beam Sputter Deposition |
| - Source Gas | Inert (Ar, Xe) |
| - Emission Structure | Plasma Bridge |
| - Regulation | Emission Current |
| - Coupling | Non-Immersed |