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The LFN2000 is a non-immersed electron source which mounts to the side of the ion source. Its range of operation is suited to applications where lower emission currents are advantageous. Several such ion beam processes where lower emission current and better resolution is desirable include the use of smaller sources and lower ion beam currents.

The LFN2000 offers an operational interval before maintenance which is vastly longer than immersed filament electron source. The long uptime is beneficial when sophisticated process runs need to continually operate without interruption. Similarly, the LFN2000 installations are a good fit in high throughput load-lock platforms where infrequent chamber venting demands reliable and low maintenance electron sources. When an eventual maintenance task is needed, the LFN’s modular architecture promotes a quick and easy step when the plug and socket feature is accessed.