The KDC100 is a middle-sized DC gridded ion source product with proven field record. It has a very successful installation base in the high volume production of thin metal multilayer structures by ion beam sputter deposition. Besides, its strong deposition foundation, a large assortment of ion optic designs provide standard configurations which are successful in many ion beam processes, including in-situ preclean, ion beam surface modification, ion beam assisted deposition, and ion beam etching. With a switching dual filament cathode set-up and self-aligned grids, the KDC100 offers valuable performance, operational and maintenance advantages. Under the standard configuration, the typical ion energy range is from 100 to 1200eV, while the ion current can exceed 400mA.