eH400

The compact and efficient eH400 is ideally suited to provide cost-effective, high-current ion beams for small to medium sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.

• Dimensions: diameter = 3.7" height = 3"
• Discharge Voltage/Current: 50-300eV/5 A
• Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors

Features & Benefits

• Removable Anode Assembly
  • Ease of maintenance
  • Minimizes down-time during maintenance
  • Plug-and-play spare anode
• Broad-Beam High Discharge Current
  • Uniform etch rates
  • High etch rate
  • High ion assist deposition (IAD) rates
• Versatile
  • Load lock/Ultra High Vacuum (UHV) compatible
  • Small footprint
• Cost Efficient
  • Lower cost per mA/cm² than gridded sources
  • Low maintenance cost
• Efficient plasma conversion and stable power control

Applications

• IAD
• Load lock preclean
• In-situ preclean
• Low-energy etching
• III-V Semiconductors
• Polymer Substrates