eH2000

The powerful eH2000 is ideally suited to provide cost-effective, high-current ion beams for medium to large sized vacuum systems. It is commonly used for ion assist, precleaning, and low energy etching.

• Dimensions: diameter = 5.7" height = 5.5"
• Discharge Voltage/Current: 50-300V/10A or 15A
• Operating Gases: Ar, Xe, Kr, O2, N2, Organic Precursors

Features & Benefits

• Removable Anode Assembly
  • Ease of maintenance
  • Minimizes down-time during maintenance
  • Plug-and-play spare anode
• Broad-Beam High Discharge Current
  • Uniform etch rates
  • High etch rate
  • High ion assist deposition (IAD)rates
• Water cooled
  • Performance benefits of the eH1000 at higher output current
• Versatile
  • Load lock/Ultra High Vacuum (UHV) compatible
  • Easy installation
• Cost Efficient
  • Lower cost per mA/cm² than gridded sources
  • Low maintenance cost
• Efficient plasma conversion and stable power control

Applications

• IAD
• Load lock preclean
• In-situ preclean
• Direct Deposition
• Surface Modification
• Low-energy etching
• III-V Semiconductors
• Polymer Substrates